摘要 :
The adsorbed states of 1,1,1-trifluoro-2-propanol (TFIP) molecule on Si(100) c(4 x 2) have been investigated by high resolution electron energy loss spectroscopy. TFIP is dissociatively adsorbed on Si(100) as CF3CH(O-Si)CH3 and H-...
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The adsorbed states of 1,1,1-trifluoro-2-propanol (TFIP) molecule on Si(100) c(4 x 2) have been investigated by high resolution electron energy loss spectroscopy. TFIP is dissociatively adsorbed on Si(100) as CF3CH(O-Si)CH3 and H-Si at 100 K. These species are stable up to 300 K. At 400 K, CF bonds start to be dissociated. At 800 K, all adsorbed species are decomposed into SiH, SiF, SiF2 and residual carbon species. At 1050 K, the silicon carbide is formed. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 21]
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